UGC-DAE Consortium for Scientific Research
( An Autonomous Institution of University Grants Commission, New Delhi )
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Magnetron sputtering system for deposition of thin films and multilayers:
Dr. D.M Phase
UGC-DAE-CSR, Indore
The magnetron sputtering system consists of two DC and one RF sputtering sources for deposition of metallic and insulating thin films and multilayer structures with substrate heating arrangement. The operation of the system is fully computer controlled.
A view of magnetron sputtering set up and plasma of Ti target (in the inset).
Specifications

  • Two DC source                  : 1  kW each
  • One RF source                   : 600 W
  • Base pressure                    : ~ 10-8 Torr
  • Target size                        : 75 mm dia
  • Substrate size                    : Max 75 mm dia
  • Substrate target distance     : 4 -10 cm
  • Substrate temperature         : 300 - 800 C
  • Different gas inlet:              : Ar, O2, N2, CH4.